Waste Gas Treatment
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ESCAPE (burn/wet)
The Burning/Scrubbing Technology is one of the most effective technologies for waste gas abatement, with lowest Cost-of-Ownership, on a worldwide basis.
Brochure:
DAS ESCAPE
(PDF, 970 KB)
UPTIMUM
UPTIMUM – Burn/Wet Technology for the safe and efficient treatment of CVD process gases
UPTIMUM is a leading technology for waste gas combustion with a simultaneous cleaning of the remaining materials. The system can treat up to 500 slm of waste gases from CVD processes, which are fed into the combined burner-scrubber system via a maximum of four separate waste gas inlets. Unlike the ESCAPE technology, the gases are burnt from top to bottom. A liquid film on the inside wall of the reactor prevents corrosion and the sedimentation of solid particles. Soluble components are absorbed and particles suspended in the scrubbing column, which is located parallel to the reactor. Deposition gases such as SiH4, NH3 etc. and chamber cleaning gases such as NF3, F2 or SF6, can be safely and efficiently disposed of by UPTIMUM.
The system is characterised by a high availability and treatment efficiency, minimum service work, a small footprint, network compatibility and low acquisition costs.
Various fuel gases can be used.
Brochure: DAS UPTIMUM (PDF, 800 KB)
GIANT (burn/wet)
GIANT is a combined burner-scrubber system for higher waste gas flows. Deposition gases such as SiH4, NH3, ect. as well as chamber clean gases like NF3 or F2 can be treated safely and efficiently.
Brochure: DAS GIANT (PDF, 830 KB)
EDC -1500
Electrostatic dust collector for particle-containing or aerosol-containing gas flows up to 90m³/h. A fluid wall protects the ground electrode from deposition of particles. The electrode is equipped with an automatic self cleaning mechanism which reduces the risk of exhaust blockage and can be used with the most abatement devices.
Brochure: DAS EDC (PDF, 570 KB)
AQUABATE
AQUABATE is our wet treatment technology to abate waste gases efficiently, safely and nearly maintenance free. The wet scrubbers are offered for different processes.
Brochure: DAS AQUABATE (PDF, 860 KB)
AQUABATEEPI
EPI stands for epitaxy. These scrubbers are developed especially for abatement of epitaxy processes. Special care was given to the high safety standard in respect to the hydrogen carrier gas. After scrubbing, the hydrogen is diluted in controlled way below LEL.
Brochure: DAS AQUABATE (PDF, 860 KB)
Monitoring
MONITORING has been developed to manage waste gas abatement equipment in critical semiconductor manufacturing processes. Key requirements include equipment monitoring, performance enhancement and improvements to the maintenance logistics. MONITORING automatically records the operating states and process parameters of the ESCAPE units, as well as the central lye supply system. All information is stored in a data bank. The advantages of MONITORING include:
